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The aim of this study was to find the optimal settings of magnetron sputtering deposition of thin titanium nitride layers with respect to the size and hardness of the deposited layer. Direct sputtering deposition of the ceramic target using a radiofrequency source was used for magnetron sputtering deposition. The advantage of this method is easier finding of optimal deposition parameters. X-ray reflectometry was used to characterize the coating in terms of thickness. The hardness was determined by the Berkovich tip. To optimize the thickness and hardness of the TiN coating, a rotatable central composite design of response area for pressure and performance was used. Using only statistically significant fac-tors, mathematical models of thickness and hardness of TiN coating were con-structed. Based on these mathematical models, the optimal settings of statistically significant TiN magnetron deposition factors were found.
